EUV lithography

E198143

EUV lithography is an advanced semiconductor manufacturing technique that uses extremely short-wavelength ultraviolet light to create ultra-fine patterns on microchips, enabling the production of cutting-edge integrated circuits.

All labels observed (5)

How this entity was disambiguated

Statements (50)

Predicate Object
instanceOf lithography technology ⓘ
semiconductor manufacturing process ⓘ
benefit higher transistor density ⓘ
improved pattern fidelity ⓘ
reduced multi-patterning complexity ⓘ
challenge high tool cost ⓘ
low source power ⓘ
mask defects ⓘ
photoresist stochastic effects ⓘ
stringent contamination control ⓘ
commercializedBy ASML ⓘ
comparedTo uses shorter wavelength than deep ultraviolet lithography ⓘ
developedBy ASML ⓘ
developedWithContributionsFrom IMEC ⓘ
Intel ⓘ
linked to: Intel Corporation

Samsung Electronics ⓘ
linked to: Samsung

Sematech ⓘ
TSMC ⓘ
enables 3 nm process node ⓘ
5 nm process node ⓘ
7 nm process node ⓘ
advanced technology nodes ⓘ
high-resolution patterning ⓘ
sub-10-nanometer feature sizes ⓘ
firstHighVolumeManufacturingUse around 2019 ⓘ
industryStandardWavelength 13.5 nm EUV line ⓘ
keyComponent EUV mask ⓘ
EUV pellicle ⓘ
EUV resist ⓘ
EUV scanner ⓘ
lightGenerationMethod tin droplet laser-produced plasma ⓘ
operatesIn vacuum chamber ⓘ
relatedTo Moore's law ⓘ
requires EUV light source ⓘ
complex mask technology ⓘ
high numerical aperture optics ⓘ
multilayer mirrors ⓘ
photoresist materials sensitive to EUV ⓘ
vacuum environment ⓘ
successorOf deep ultraviolet lithography ⓘ
supports continued transistor scaling ⓘ
typicalWavelength 13.5 nanometers ⓘ
usedFor fabrication of integrated circuits ⓘ
patterning semiconductor wafers ⓘ
usedIn advanced DRAM manufacturing ⓘ
logic chip manufacturing ⓘ
uses Bragg reflector mirrors ⓘ
laser-produced plasma light sources ⓘ
reflective masks ⓘ
usesWavelength extreme ultraviolet light ⓘ

How these facts were elicited

Referenced by (5)

Full triples — surface form annotated when it differs from this entity's canonical label.

Fresnel zone plate → usedFor → EUV lithography ⓘ
subject linked to: Fresnel zone plates
ASML → hasProduct → EUV lithography systems ⓘ
linked to: EUV lithography
ASML → coreTechnology → Extreme ultraviolet lithography ⓘ
linked to: EUV lithography
ASML → notableProduct → extreme ultraviolet (EUV) lithography systems ⓘ
linked to: EUV lithography
EUV pellicle → usedIn → extreme ultraviolet lithography ⓘ
linked to: EUV lithography