Triple
T31733325
| Position | Surface form | Disambiguated ID | Type / Status |
|---|---|---|---|
| Subject | CMOS technology |
E809918
|
entity |
| Predicate | evolvedInto |
P1245
|
FINISHED |
| Object |
FD-SOI CMOS processes
FD-SOI CMOS processes are advanced semiconductor manufacturing technologies that use a thin insulating layer beneath a fully depleted silicon channel to improve performance, reduce power consumption, and enhance control over transistor behavior compared to traditional bulk CMOS.
|
E1976568
|
NE FINISHED |
How this triple was built (2 steps)
Every LLM step that produced this triple, in pipeline order — named-entity classification, the disambiguation choices (the exact options shown, with the pick highlighted), and the generated description. The batch + timestamp of each is in the Provenance table below.
NER
Named-entity recognition
gpt-5-mini
Instruction
Given a phrase, classify it is english named entity (e.g., persons, organizations, works of art) in Latin script, or not (e.g., literals, dates, URLs, verbose phrases). For disambiguation, the statement where the phrase occurs as object is also given. Please return a JSON object with `phrase` (string, the phrase being analyzed) and `is_ne` (boolean, indicating whether the phrase is a Named Entity).
Input
Phrase: FD-SOI CMOS processes | Statement: [CMOS technology, evolvedInto, FD-SOI CMOS processes]
NEDg
Description generation
gpt-5.1
Instruction
Generate a one-sentence description of the target entity. You are given a context triple in the form (subject, predicate, object), where the object is the target entity. # Instructions Use the triple to infer relevant information about the entity. Describe the entity based on what is most defining, well-known. Avoid repeating the information from the triple, unless really essential. # Response Format Return only the sentence: "Description: [one-sentence description of the target entity]"
Input
Entity: FD-SOI CMOS processes Triple: [CMOS technology, evolvedInto, FD-SOI CMOS processes]
Generated description
FD-SOI CMOS processes are advanced semiconductor manufacturing technologies that use a thin insulating layer beneath a fully depleted silicon channel to improve performance, reduce power consumption, and enhance control over transistor behavior compared to traditional bulk CMOS.
Provenance (5 batches)
The batch behind each pipeline step, in order, with when it ran. Timestamps are batch-level — stages were processed in waves, so the object chain (NER → NED1 → NEDg → NED2) reads in order, but predicate / elicitation batches can sit in a different wave.
| Step | Stage | Batch ID | Status | When |
|---|---|---|---|---|
| creating | Elicitation | batch_69f348e0e4908190a884582eca646fb7 |
completed | April 30, 2026, 12:19 p.m. |
| NER | Named-entity recognition | batch_69f6ab2198c881908cc01f933f2b870b |
completed | May 3, 2026, 1:55 a.m. |
| NED1 | Entity disambiguation (via context triple) | batch_6a2b947956648190badb026e05af1999 |
completed | June 12, 2026, 5:09 a.m. |
| NEDg | Description generation | batch_6a2b951b5f0c8190b05974307ab529d0 |
completed | June 12, 2026, 5:11 a.m. |
| NED2 | Entity disambiguation (via description) | batch_6a2b95bb5bfc81908740d2f57f30e914 |
completed | June 12, 2026, 5:14 a.m. |
Created at: April 30, 2026, 11:22 p.m.