Triple

T31733325
Position Surface form Disambiguated ID Type / Status
Subject CMOS technology E809918 entity
Predicate evolvedInto P1245 FINISHED
Object FD-SOI CMOS processes
FD-SOI CMOS processes are advanced semiconductor manufacturing technologies that use a thin insulating layer beneath a fully depleted silicon channel to improve performance, reduce power consumption, and enhance control over transistor behavior compared to traditional bulk CMOS.
E1976568 NE FINISHED

How this triple was built (2 steps)

Every LLM step that produced this triple, in pipeline order — named-entity classification, the disambiguation choices (the exact options shown, with the pick highlighted), and the generated description. The batch + timestamp of each is in the Provenance table below.

NER Named-entity recognition gpt-5-mini
Instruction
Given a phrase, classify it is english named entity (e.g., persons, organizations, works of art) in Latin script, or not (e.g., literals, dates, URLs, verbose phrases). For disambiguation, the statement where the phrase occurs as object is also given. Please return a JSON object with `phrase` (string, the phrase being analyzed) and `is_ne` (boolean, indicating whether the phrase is a Named Entity).
Input
Phrase: FD-SOI CMOS processes | Statement: [CMOS technology, evolvedInto, FD-SOI CMOS processes]
NEDg Description generation gpt-5.1
Instruction
Generate a one-sentence description of the target entity. 
You are given a context triple in the form (subject, predicate, object), where the object is the target entity. 
# Instructions
Use the triple to infer relevant information about the entity. Describe the entity based on what is most defining, well-known. 
Avoid repeating the information from the triple, unless really essential.
# Response Format
Return only the sentence: "Description: [one-sentence description of the target entity]"
Input
Entity: FD-SOI CMOS processes
Triple: [CMOS technology, evolvedInto, FD-SOI CMOS processes]
Generated description
FD-SOI CMOS processes are advanced semiconductor manufacturing technologies that use a thin insulating layer beneath a fully depleted silicon channel to improve performance, reduce power consumption, and enhance control over transistor behavior compared to traditional bulk CMOS.

Provenance (5 batches)

The batch behind each pipeline step, in order, with when it ran. Timestamps are batch-level — stages were processed in waves, so the object chain (NER → NED1 → NEDg → NED2) reads in order, but predicate / elicitation batches can sit in a different wave.

Step Stage Batch ID Status When
creating Elicitation batch_69f348e0e4908190a884582eca646fb7 completed April 30, 2026, 12:19 p.m.
NER Named-entity recognition batch_69f6ab2198c881908cc01f933f2b870b completed May 3, 2026, 1:55 a.m.
NED1 Entity disambiguation (via context triple) batch_6a2b947956648190badb026e05af1999 completed June 12, 2026, 5:09 a.m.
NEDg Description generation batch_6a2b951b5f0c8190b05974307ab529d0 completed June 12, 2026, 5:11 a.m.
NED2 Entity disambiguation (via description) batch_6a2b95bb5bfc81908740d2f57f30e914 completed June 12, 2026, 5:14 a.m.
Created at: April 30, 2026, 11:22 p.m.